JPH0539625Y2 - - Google Patents
Info
- Publication number
- JPH0539625Y2 JPH0539625Y2 JP18624786U JP18624786U JPH0539625Y2 JP H0539625 Y2 JPH0539625 Y2 JP H0539625Y2 JP 18624786 U JP18624786 U JP 18624786U JP 18624786 U JP18624786 U JP 18624786U JP H0539625 Y2 JPH0539625 Y2 JP H0539625Y2
- Authority
- JP
- Japan
- Prior art keywords
- quartz tube
- furnace body
- pressure
- intermediate chamber
- intermediate cover
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010453 quartz Substances 0.000 claims description 91
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 91
- 239000004065 semiconductor Substances 0.000 description 8
- 235000012431 wafers Nutrition 0.000 description 8
- 238000000034 method Methods 0.000 description 5
- 239000000428 dust Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18624786U JPH0539625Y2 (en]) | 1986-12-03 | 1986-12-03 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18624786U JPH0539625Y2 (en]) | 1986-12-03 | 1986-12-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6390827U JPS6390827U (en]) | 1988-06-13 |
JPH0539625Y2 true JPH0539625Y2 (en]) | 1993-10-07 |
Family
ID=31135629
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18624786U Expired - Lifetime JPH0539625Y2 (en]) | 1986-12-03 | 1986-12-03 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0539625Y2 (en]) |
-
1986
- 1986-12-03 JP JP18624786U patent/JPH0539625Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS6390827U (en]) | 1988-06-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3183575B2 (ja) | 処理装置および処理方法 | |
JPH0613361A (ja) | 処理装置 | |
JP3121915B2 (ja) | 封止装置 | |
JPH088194A (ja) | 気相成長機構および熱処理機構における加熱装置 | |
JPH04308090A (ja) | 気相化学反応生成装置のロードロック機構 | |
JPH0539625Y2 (en]) | ||
JP3173697B2 (ja) | 縦型熱処理装置 | |
JP2004214283A (ja) | 半導体製造装置 | |
JP2691159B2 (ja) | 縦型熱処理装置 | |
JP3055797B2 (ja) | 縦型熱処理装置 | |
JP3047750B2 (ja) | プラズマ装置 | |
JP3463785B2 (ja) | 封止装置および処理装置 | |
JP3056240B2 (ja) | 熱処理装置 | |
JP3420465B2 (ja) | 縦型熱処理装置 | |
JP3073161B2 (ja) | 真空処理装置 | |
JPH08162422A (ja) | 熱処理装置 | |
JPH0151543B2 (en]) | ||
JP3005394U (ja) | 気相成長機構および熱処理機構における加熱装置 | |
JPS6125246Y2 (en]) | ||
JP3116339B2 (ja) | 拡散用石英アンプル | |
JPH0648315Y2 (ja) | 真空熱処理炉 | |
JP2831813B2 (ja) | 半導体気相成長装置 | |
JPH0315336B2 (en]) | ||
JP2000216149A (ja) | 基板処理装置 | |
JPH0526735Y2 (en]) |